PVD Magnetron Sputting Coating Machine
Make use of the principle of magnetron sputtering to plate the foil surface with nano-scale coating.
In the field of composite current collector, nano-scale copper seed layer can be plated on the surface of PP/PET film.
Technical Parameters
Item
Parameter
Film forming width
Customized, 800-1700mm
Film forming speed
8-50m/min
Coating layer thickness
20-80nm
Composite copper foil coated film resistance
1-2.5 Ω
Maximum coated roll diameter
Φ600mm
Key Features
Transfer the target material to the attachment based on the principle of magnetron sputtering
Built-in winding mechanism, mainly for foil that can be unwound and rewound
Thin coating (ranging from several nm to several hundred nm) varies greatly due to different target materials
Temperature, torque, speed and other parameters are independently controlled at all levels
